Product Code : ST-Fe/Mn-5N-Cu
Iron manganese (Fe/Mn) sputtering target is a composite material made up of iron (Fe) and manganese (Mn) and is used to deposit thin films in various electronic, magnetic, and optoelectronic applications. The combination of iron and manganese provides excellent physical and chemical properties, such as high magnetic moments and large magnetic anisotropy energies, making them suitable for use in magnetic recording media and sensors, spintronics, and hard and soft magnetic films.
Fe/Mn sputtering targets are particularly crucial in the production of magnetic thin films, where manganese is used as a dopant to the iron layer, resulting in the formation of a magnetic layer with preferable and controlled magnetic properties. They also play a vital role in the production of multilayered magnetic films that are used in electronics applications such as read heads in hard disk drives, giant magnetoresistance (GMR) sensors, magnetic tunnel junctions, and other spintronic devices.
Fe/Mn sputtering targets are produced using powder metallurgy techniques. Iron and manganese powders are mixed uniformly in a specific ratio, pressed, and sintered under high temperature and vacuum conditions to form a homogenous and dense target material. The target is then machined to the desired shape and size that matches the sputtering system.
Fe/Mn sputtering targets can be manufactured in a variety of sizes and shapes, including rectangular, circular, and custom-made shapes. They can also be supplied in either bonded or unbonded forms, depending on the user's specific requirements.
In conclusion, iron manganese (Fe/Mn) sputtering targets are fundamental materials used to deposit thin films in various electronic, magnetic, and optoelectronic applications. They exhibit excellent magnetic properties, and their combination provides a unique approach to enhancing the properties of magnetic thin films, making them suitable for use in a wide range of electronic devices.
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Product Information
Iron manganese (Fe/Mn) sputtering target is a composite material made up of iron (Fe) and manganese (Mn) and is used to deposit thin films in various electronic, magnetic, and optoelectronic applications. The combination of iron and manganese provides excellent physical and chemical properties, such as high magnetic moments and large magnetic anisotropy energies, making them suitable for use in magnetic recording media and sensors, spintronics, and hard and soft magnetic films.
Fe/Mn sputtering targets are particularly crucial in the production of magnetic thin films, where manganese is used as a dopant to the iron layer, resulting in the formation of a magnetic layer with preferable and controlled magnetic properties. They also play a vital role in the production of multilayered magnetic films that are used in electronics applications such as read heads in hard disk drives, giant magnetoresistance (GMR) sensors, magnetic tunnel junctions, and other spintronic devices.
Fe/Mn sputtering targets are produced using powder metallurgy techniques. Iron and manganese powders are mixed uniformly in a specific ratio, pressed, and sintered under high temperature and vacuum conditions to form a homogenous and dense target material. The target is then machined to the desired shape and size that matches the sputtering system.
Fe/Mn sputtering targets can be manufactured in a variety of sizes and shapes, including rectangular, circular, and custom-made shapes. They can also be supplied in either bonded or unbonded forms, depending on the user's specific requirements.
In conclusion, iron manganese (Fe/Mn) sputtering targets are fundamental materials used to deposit thin films in various electronic, magnetic, and optoelectronic applications. They exhibit excellent magnetic properties, and their combination provides a unique approach to enhancing the properties of magnetic thin films, making them suitable for use in a wide range of electronic devices.
Chemical Formula: Fe/Mn
Synonyms
Mangalloy, manganese steel, Hadfield steel
Iron Manganese (Fe/Mn) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Iron Manganese (Fe/Mn)Sputtering Target
Iron Manganese (Fe/Mn) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Iron Manganese (Fe/Mn) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Iron Manganese (Fe/Mn) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
