Iron Nickel Sputtering Target, Fe/Ni

Product Information

The iron nickel sputtering target from ATT is an alloy sputtering material containing Fe and Ni.

Iron, also called ferrum, is a chemical element that originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with a location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Nickel is a chemical element that originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with a location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.

ATT provides high-quality Iron Nickel Sputtering Target for research and industry purposes at competitive prices. We can provide Iron Nickel Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula: Fe/Ni
CAS Number: 12168-54-6
Purity: 99.9%, 99.95%, 99.99%

Synonyms

N/A

Iron Nickel Sputtering Target Specification

Size：

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of  Iron Nickel Sputtering Target

The iron nickel sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packing of Iron Nickel Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Iron Nickel Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers