Custom Lanthanum (La) Sputtering Target

Lanthanum (La) Sputtering Target

Product Code : ST-La-5N-Cu

Lanthanum sputtering targets are ideal for material deposition applications, which require the use of thin layers of materials. These targets are usually used for sputtering in a vacuum chamber. They are composed of high purity Lanthanum metal alloys and can be used for thin-film deposition in various fields such as electronics, optics, aerospace, automotive, medical, and energy. Depending on the desired application, the target composition, size, shape, and purity can be tailored accordingly. Lanthanum sputtering targets are available in a variety of sizes, coats, and forms, depending on your specific needs.

Product Information

Chemical Formula: La
CAS Number: 7439-91-0

Synonyms

Lanthanum sputter target, 45740, 45932, 46064

Lanthanum (La) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Circular Sputtering Targets	Diameter	1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular Sputtering Targets	Width x Length	5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness		0.125”, 0.25”

Properties（Theoretical）

Molecular Weight	138.91
Appearance	Solid
Melting Point	915-925 °C
Boiling Point	3464 °C
Density	6.162 g/cm³ (r.t.)
Solubility in H2O	N/A
Crystal Phase / Structure	double hexagonal close-packed (dhcp)
Electrical Resistivity	615 nΩ·m (r.t.)
Electronegativity	1.1 Paulings
Heat of Fusion	6.20 kJ/mol
Heat of Vaporization	400 kJ/mol
Poisson's Ratio	0.280
Specific Heat	0.1951 J/g·°C
Tensile Strength	131 MPa (ultimate)
Thermal Conductivity	13.4 W/m·K
Thermal Expansion	12.1 µm/m·K (r.t.)
Vickers Hardness	360–1750 MPa
Young's Modulus	36.6 GPa

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Lanthanum (La) Sputtering Target

Indium (In) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Lanthanum (La) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Lanthanum (La) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear Formula	La
MDL Number	MFCD00011066
EC No.	231-099-0
Beilstein/Reaxys No.	N/A
Pubchem CID	23926
IUPAC Name	lanthanum
SMILES	[La]
InchI Identifier	InChI=1S/La
InchI Key	FZLIPJUXYLNCLC-UHFFFAOYSA-N

Product	Product Code	Purity	Size	Contact Us
Lanthanum (La) Sputtering Target	ST-La-2N-Cu	99%	Customize
Lanthanum (La) Sputtering Target	ST-La-3N-Cu	99.9%	Customize
Lanthanum (La) Sputtering Target	ST-La-4N-Cu	99.99%	Customize
Lanthanum (La) Sputtering Target	ST-La-5N-Cu	99.999%	Customize