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Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Target

Product Code : ST-La0.67Ca0.33MnO3-5N-Cu

Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) sputtering target is a material used in thin film deposition processes, particularly in the production of high-performance magnetic recording media, microelectronics, and other advanced materials. The sputtering process involves bombarding the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate.

The use of La0.67Ca0.33MnO3 sputtering targets has become increasingly popular due to their excellent electrical conductivity, high-temperature stability, and magnetic properties. These properties make them suitable for a wide range of applications, such as spintronics, sensors, and magnetic data storage.

The production of La0.67Ca0.33MnO3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.

Overall, La0.67Ca0.33MnO3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced applications that require thin film deposition.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Target ST-La0.67Ca0.33MnO3-2N-Cu 99% Customize
Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Target ST-La0.67Ca0.33MnO3-3N-Cu 99.9% Customize
Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Target ST-La0.67Ca0.33MnO3-4N-Cu 99.99% Customize
Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Target ST-La0.67Ca0.33MnO3-5N-Cu 99.999% Customize

Product Information

Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) sputtering target is a material used in thin film deposition processes, particularly in the production of high-performance magnetic recording media, microelectronics, and other advanced materials. The sputtering process involves bombarding the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate.

The use of La0.67Ca0.33MnO3 sputtering targets has become increasingly popular due to their excellent electrical conductivity, high-temperature stability, and magnetic properties. These properties make them suitable for a wide range of applications, such as spintronics, sensors, and magnetic data storage.

The production of La0.67Ca0.33MnO3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.

Overall, La0.67Ca0.33MnO3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced applications that require thin film deposition.


Chemical Formula: La0.67Ca0.33MnO3

CAS Number:   123273-09-6

Synonyms

LCM, Lanthanum Calcium Manganate, LCMO, Calcium-doped lanthanum manganese oxide, Calcia-substituted lanthanum manganite, Lanthanum Calcium Manganese Oxide, (La0.85Ca0.15)0.97MnO3, La0.5Ca0.5MnO3, La0.7Ca0.3MnO3, La0.67Ca0.33MnO3, La1-xCaxMnO3, La(1-x)Ca(x)MnOy



La0.67Ca0.33MnO3 Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”



Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of La0.67Ca0.33MnO3 Sputtering Target

La0.67Ca0.33MnO3 Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  La0.67Ca0.33MnO3 Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’La0.67Ca0.33MnO3 Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.



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