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Lanthanum Manganate (LaMnO3) sputtering target is a material used in thin film deposition processes, particularly in the production of high-performance magnetic recording media, microelectronics, and other advanced materials. The sputtering process involves bombarding the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate.
The use of LaMnO3 sputtering targets has become increasingly popular due to their excellent electrical conductivity, high-temperature stability, and magnetic properties. These properties make them suitable for a wide range of applications, such as spintronics, sensors, and magnetic data storage.
The production of LaMnO3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.
Overall, LaMnO3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced applications that require thin film deposition. They have been extensively studied for various applications such as sensors, catalysts, batteries, and electronic devices.
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Product Information
Lanthanum Manganate (LaMnO3) sputtering target is a material used in thin film deposition processes, particularly in the production of high-performance magnetic recording media, microelectronics, and other advanced materials. The sputtering process involves bombarding the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate.
The use of LaMnO3 sputtering targets has become increasingly popular due to their excellent electrical conductivity, high-temperature stability, and magnetic properties. These properties make them suitable for a wide range of applications, such as spintronics, sensors, and magnetic data storage.
The production of LaMnO3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.
Overall, LaMnO3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced applications that require thin film deposition. They have been extensively studied for various applications such as sensors, catalysts, batteries, and electronic devices.
Chemical Formula: LaMnO3
CAS Number: 12031-12-8
Synonyms
LMO, Lanthanum manganite, lanthanum manganese oxide, lanthanum manganate(III)
Lanthanum Manganate (LaMnO3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Compound Formula | LaMnO3 |
| Molecular Weight | 241.84 |
| Appearance | Target |
| Melting Point | N/A |
| Boiling Point | N/A |
| Density | N/A |
| Solubility in H2O | N/A |
| Crystal Phase / Structure | perovskite |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Lanthanum Manganate (LaMnO3) Sputtering Target
Lanthanum Manganate (LaMnO3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Lanthanum Manganate (LaMnO3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Lanthanum Manganate (LaMnO3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
