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Lanthanum Nickel Oxide (LaNiO3) Sputtering Target

Product Code : ST-LaNiO3-5N-Cu

Lanthanum Nickel Oxide (LaNiO3) sputtering target is a material used in thin film deposition processes, particularly in the production of high-performance electronic devices, such as transistors, capacitors, resistors, and other electronic components.

LaNiO3 sputtering targets are widely used due to their excellent electrical conductivity, high-temperature stability, and low resistivity. These properties make them ideal for use in applications such as magnetic data storage devices, sensors, and energy storage devices.

The production of LaNiO3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.

Overall, LaNiO3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced electronic applications that require thin film deposition. They have been extensively studied for their use in producing advanced electronic devices with improved performance and efficiency.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Lanthanum Nickel Oxide (LaNiO3) Sputtering Target ST-LaNiO3-2N-Cu 99% Customize
Lanthanum Nickel Oxide (LaNiO3) Sputtering Target ST-LaNiO3-3N-Cu 99.9% Customize
Lanthanum Nickel Oxide (LaNiO3) Sputtering Target ST-LaNiO3-4N-Cu 99.99% Customize
Lanthanum Nickel Oxide (LaNiO3) Sputtering Target ST-LaNiO3-5N-Cu 99.999% Customize

Product Information

Lanthanum Nickel Oxide (LaNiO3) sputtering target is a material used in thin film deposition processes, particularly in the production of high-performance electronic devices, such as transistors, capacitors, resistors, and other electronic components.

LaNiO3 sputtering targets are widely used due to their excellent electrical conductivity, high-temperature stability, and low resistivity. These properties make them ideal for use in applications such as magnetic data storage devices, sensors, and energy storage devices.

The production of LaNiO3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.

Overall, LaNiO3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced electronic applications that require thin film deposition. They have been extensively studied for their use in producing advanced electronic devices with improved performance and efficiency.

Chemical Formula: LaNiO3

CAS Number:   12031-18-4

Synonyms

LNO, lanthanum nickelate, LaNiO, LaNiO3, La2NiO4



Lanthanum Nickel Oxide (LaNiO3) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Compound FormulaLaNiO3
Molecular Weight245.60
AppearanceSolid
Melting PointN/A
Boiling PointN/A
DensityN/A
Solubility in H2ON/A




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Lanthanum Nickel Oxide (LaNiO3) Sputtering Target

Lanthanum Nickel Oxide (LaNiO3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Lanthanum Nickel Oxide (LaNiO3) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Lanthanum Nickel Oxide (LaNiO3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.



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