Product Code : ST-La2O3-5N-Cu
Lanthanum Oxide (La2O3) sputtering target is a material used in thin film deposition processes, particularly in the production of advanced electronic, optical, and magnetic materials. The sputtering process involves bombarding the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate.
La2O3 sputtering targets are widely used due to their excellent electrical insulation properties, high-temperature stability, and good optical properties. These properties make them ideal for use in applications such as LEDs, semiconductor devices, and optical coatings.
The production of La2O3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.
Overall, La2O3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced electronic and optical applications that require thin film deposition. They have been extensively studied for their use in producing advanced electronic and optical devices with improved performance and efficiency.
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Product Information
Lanthanum Oxide (La2O3) sputtering target is a material used in thin film deposition processes, particularly in the production of advanced electronic, optical, and magnetic materials. The sputtering process involves bombarding the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate.
La2O3 sputtering targets are widely used due to their excellent electrical insulation properties, high-temperature stability, and good optical properties. These properties make them ideal for use in applications such as LEDs, semiconductor devices, and optical coatings.
The production of La2O3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.
Overall, La2O3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced electronic and optical applications that require thin film deposition. They have been extensively studied for their use in producing advanced electronic and optical devices with improved performance and efficiency.
Chemical Formula: La2O3
CAS Number: 1312-81-8
Synonyms
Lanthanum(III) oxide, Lanthanum(III) trioxide, Lanthanum sesquioxide, Lanthanum trioxide, Dilanthanum trioxide, Lanthana
Lanthanum Oxide (La2O3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Compound Formula | La2O3 |
| Molecular Weight | 325.81 |
| Appearance | White Target |
| Melting Point | 2,315° C (4,199° F) |
| Boiling Point | 4,200° C (7,592° F) |
| Density | 6.51 g/cm3 |
| Solubility in H2O | N/A |
| Exact Mass | 325.797 |
| Monoisotopic Mass | 325.797 |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Lanthanum Oxide (La2O3) Sputtering Target
Lanthanum Oxide (La2O3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Lanthanum Oxide (La2O3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Lanthanum Oxide (La2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifier
| Linear Formula | La2O3 |
| MDL Number | MFCD00011071 |
| EC No. | 215-200-5 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 3280778 |
| IUPAC Name | lanthanum(3+); oxygen(2-) |
| SMILES | [O-2].[O-2].[O-2].[La+3].[La+3] |
| InchI Identifier | InChI=1S/2La.3O/q2*+3;3*-2 |
| InchI Key | MRELNEQAGSRDBK-UHFFFAOYSA-N |
