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Lithium (Li) Sputtering Target

Lithium (Li) Sputtering Target

Product Code : ST-Li-5N-Cu

Lithium (Li) sputtering targets are commonly used in physical vapor deposition (PVD) processes for depositing thin films of lithium onto a substrate. Lithium is a soft, silvery-white alkali metal that has unique physical and chemical properties, making it attractive for a range of applications in the fields of electronics, optics, and energy storage.

The sputtering process involves bombarding the target material with high-energy ions, which dislodge atoms from the target surface and deposit them onto a substrate to form a thin film. Lithium sputtering targets are made of high-purity lithium metal or lithium alloys and are available in various shapes and sizes, such as round disks, rectangular tiles, and custom shapes.

Lithium sputtering targets are highly durable and provide consistent, high-quality thin films in PVD processes. They have a low atomic mass, low melting point, and good electrical conductivity, which make them suitable for use in high-energy and high-power density applications.

Lithium sputtering targets are commonly used in the production of electronic devices, such as batteries, fuel cells, capacitors, and semiconductors. They are also used in the manufacture of optical products, such as lenses, mirrors, and coatings, due to their unique optical properties.

Furthermore, lithium sputtering targets are used in the production of advanced materials, such as superconducting ceramics, high-temperature alloys, and hydrogen storage compounds. They are also used in the nuclear industry for the production of tritium, a radioactive isotope of hydrogen.

Overall, lithium sputtering targets are highly valued in many high-tech industries due to their unique properties and a wide range of applications.


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Product Information

Lithium (Li) sputtering targets are commonly used in physical vapor deposition (PVD) processes for depositing thin films of lithium onto a substrate. Lithium is a soft, silvery-white alkali metal that has unique physical and chemical properties, making it attractive for a range of applications in the fields of electronics, optics, and energy storage.

The sputtering process involves bombarding the target material with high-energy ions, which dislodge atoms from the target surface and deposit them onto a substrate to form a thin film. Lithium sputtering targets are made of high-purity lithium metal or lithium alloys and are available in various shapes and sizes, such as round disks, rectangular tiles, and custom shapes.

Lithium sputtering targets are highly durable and provide consistent, high-quality thin films in PVD processes. They have a low atomic mass, low melting point, and good electrical conductivity, which make them suitable for use in high-energy and high-power density applications.

Lithium sputtering targets are commonly used in the production of electronic devices, such as batteries, fuel cells, capacitors, and semiconductors. They are also used in the manufacture of optical products, such as lenses, mirrors, and coatings, due to their unique optical properties.

Furthermore, lithium sputtering targets are used in the production of advanced materials, such as superconducting ceramics, high-temperature alloys, and hydrogen storage compounds. They are also used in the nuclear industry for the production of tritium, a radioactive isotope of hydrogen.

Overall, lithium sputtering targets are highly valued in many high-tech industries due to their unique properties and a wide range of applications.

Chemical Formula: Li
CAS Number:  7439-93-2


Synonyms

N/A


Lithium (Li) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties（Theoretical）

Molecular Weight6.941
AppearanceSilvery White
Melting Point180.54°C
Boiling Point1342°C
Density0.534 g/cm3
Solubility in H2ON/A
Electrical Resistivity8.55 microhm-cm @ 0 °C
Electronegativity1.0 Paulings
Heat of Vaporization32.48 K-Cal/gm atom at 1342°C
Poisson's RatioN/A
Specific Heat0.85 Cal/g/K @ 25°C
Tensile StrengthN/A
Thermal Conductivity0.848 W/cm/K @ 298-C.2 K
Thermal Expansion(25 °C) 46 µm·m-1·K-1
Vickers HardnessN/A
Young's Modulus4.9 GPa




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Lithium (Li) Sputtering Target

Lithium (Li)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Lithium (Li) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Lithium (Li)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifiers

Linear FormulaLi
MDL NumberMFCD00134051
EC No.231-102-5
Beilstein/Reaxys No.N/A
Pubchem CID3028194
SMILES[Li]
InchI IdentifierInChI=1S/Li
InchI KeyWHXSMMKQMYFTQS-UHFFFAOYSA-N




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