Magnesium Sputtering Target, （Mg Sputtering Target），(5N) 99.999% Magnesium Sputtering Target

Product Information

Magnesium is a brilliant white metal, which is relatively soft. Applications of magnesium include its use as a deoxidiser for copper, brass and nickel alloys and it is also added to several aluminum base alloys. Alloys with zirconium and thorium have also been investigated for their use in aircraft manufacture. Pure magnesium can also be used as a sacrificial electrode to protect other metals. A high purity material used as a source for sputtering, a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment.

It is one of the more abundant elements, there being 23000 ppm in the earth's crust. As a powder, magnesium is extremely reactive, but as a solid it oxidises slowly in air and reacts slowly in water. It does not occur naturally, but is found in combination with other elements in minerals such as magnesite (MgCO₃, primarily) and dolomite (the double carbonate of magnesium and calcium). As with other elements in groups 1 and 2 of the periodic table, it can be produced by electrolysis of the molten halide. It is the basis of strong, light alloys used in the aircraft and automobile industries (e.g. in engine assemblies).

Magnesium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Magnesium Sputtering Target at competitive prices. ATT provides high-quality Magnesium Sputtering Target for research and industry purposes at competitive prices. We can provide Magnesium Sputtering Target with different purity(5N) 99.999% Magnesium Sputtering Target, size, and density according to your requirements.

Synonyms

Magnesium Sputtering Target Specification

Size：

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Purity:2N(99%), 3N5(99.95%), 4N(99.99%), 4N5(99.995%),5N(99.999%).6N(99.9999%).

Per your request or drawing

We can customized as required

Properties（Theoretical）

Chemical composition

Purity：3N（99.9%）

We can customized as required

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Applications of Magnesium Sputtering Target

ATT specializes in producing high purity Magnesium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Magnesium Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Magnesium Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’ Magnesium Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers