Product Code : ST-Mn/Ni-5N-Cu
Manganese Nickel (Mn/Ni) Sputtering Target is another material used in the process of sputtering. Mn/Ni sputtering targets are made by alloying manganese and nickel in specific ratios and then casting the material into a target of desired size and shape. These targets are widely used in semiconductor and aerospace industries. Mn/Ni sputtering targets are known for their high thermal conductivity and excellent magnetic properties, making them an ideal choice for magnetic storage media, magnetic sensors, and other thin-film applications. The high purity, uniformity, and consistency of these targets make them desirable for high-quality thin-film deposition processes.
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Product Information
Manganese Nickel (Mn/Ni) Sputtering Target is another material used in the process of sputtering. Mn/Ni sputtering targets are made by alloying manganese and nickel in specific ratios and then casting the material into a target of desired size and shape. These targets are widely used in semiconductor and aerospace industries. Mn/Ni sputtering targets are known for their high thermal conductivity and excellent magnetic properties, making them an ideal choice for magnetic storage media, magnetic sensors, and other thin-film applications. The high purity, uniformity, and consistency of these targets make them desirable for high-quality thin-film deposition processes.
Chemical Formula: Mn/Ni
Manganese Nickel (Mn/Ni) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Manganese Nickel (Mn/Ni) Sputtering Target
Manganese Nickel (Mn/Ni) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Manganese Nickel (Mn/Ni) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Manganese Nickel (Mn/Ni) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
