Product Code : ST-Mn-5N-Cu
Manganese Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Magnesium Sputtering Target at competitive prices. ATT provides high-quality Manganese Sputtering Target for research and industry purposes at competitive prices. We can provide Magnesium Sputtering Target with different purity(5N) 99.999% Magnesium Sputtering Target, size, and density according to your requirements.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
| Product | Product Code | Purity | Size | Contact Us |
Manganese sputtering target is composed of high purity manganese metal. Manganese is abundant in the earth's crust (950 ppm) and its principle ore is pyrolusite, a crude form of the dioxide. It is obtained by reduction with aluminum or in a blast furnace. Pure manganese is a hard, brittle, silvery colored, metallic element which exists in three polymorphic forms (alpha, beta and gamma) and has a complicated crystal structure. It resembles iron in being moderately reactive and dissolving in cold, dilute non-oxidising acids. When exposed to air, manganese forms an extremely stable oxide coating which is not easily reduced. Pure manganese is ferromagnetic after processing. Manganese is not used as the basis of alloys but it is a common constituent of alloys based on other systems, its addition resulting in a significant improvement in the physical and mechanical properties of the resulting alloys. For example, it is present in all steels and cast iron, the concentration being increased for special grades of material; it is also added to certain grades of brass and bronze as well as some nickel and aluminum base alloys. Manganese is also an important element for living beings as manganese deficiency can result in weakened bones and cause them to be easily broken. On average, a human body will contain 12 mg of the element.
Manganese Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Magnesium Sputtering Target at competitive prices. ATT provides high-quality Manganese Sputtering Target for research and industry purposes at competitive prices. We can provide Magnesium Sputtering Target with different purity(5N) 99.999% Magnesium Sputtering Target, size, and density according to your requirements.
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Purity:2N(99%), 3N5(99.95%), 4N(99.99%), 4N5(99.995%),5N(99.999%).6N(99.9999%).
Per your request or drawing
We can customized as required
Properties（Theoretical）
| Molecular Weight | 54.94 |
| Appearance | Silvery |
| Melting Point | 1244°C |
| Boiling Point | 1962 °C |
| Density | 7.21-7.44 g/cm3 |
| Electrical resistivity ( µOhmcm ) | 160@20°C |
| Electrical Resistivity | 185.0 microhm-cm @ 25 °C |
| Material condition | Polycrystalline |
| Electronegativity | 1.5 Paulings |
| Heat of Vaporization | 53.7 K-Cal/gm atom at 1962°C |
| Latent heat of evaporation ( J g⁻¹ ) | 4207 |
| Poisson's ratio ( Polycrystalline ) | 0.24 |
| Specific Heat | 0.114 Cal/g/K @ 25°C |
| Thermal conductivity ( W m⁻¹ K⁻¹ ) | 7.81 @0-100°C |
| Thermal Expansion | (25 °C) 21.7 µm·m-1·K-1 |
| Coefficient of thermal expansion ( x10⁻⁶ K⁻¹ ) | 23.000 @0-100°C |
| Young's Modulus | 198 GPa |
| Latent heat of fusion ( J g⁻¹ ) | 267 |
| Tensile modulus ( GPa ) ( Polycrystalline ) | 191 |
| Hardness - Mohs ( Polycrystalline ) | 5 |
| Bulk modulus ( GPa ) ( Polycrystalline ) | 118 |
Chemical composition
Purity：4N（99.99%）
| Element | 4N | 2N8 |
| Ca | ND※ | ND※ |
| Cr | 20 | 130 |
| Fe | 30 | 1400 |
| Mg | ND※ | 70 |
| Si | ND※ | 10 |
We can customized as required
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
The manganese sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Manganese is an important alloying agent. Adding manganese to steel can improve the quality of rolling and forging, and increase the strength, toughness, stiffness, wear resistance, hardness and hardenability of steel. Adding manganese to aluminum and antimony can form ferromagnetic compounds, especially in the presence of small amounts of copper.
Manganese can also be used to create an amethyst color in the glass.
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’ Manganese Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
| Linear Formula | Mn |
| CAS #: | 7439-96-5 |
| MDL Number | MFCD00011111 |
| EC No. | 231-105-1 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 23930 |
| SMILES | [Mn] |
| InchI Identifier | InChI=1S/Mn |
| InchI Key | PWHULOQIROXLJO-UHFFFAOYSA-N |
