Product Code :
Molybdenum Aluminium (Mo/Al) Sputtering Target is a material used in the process of sputtering. Mo/Al sputtering targets are made by alloying molybdenum and aluminum in specific ratios and then casting the material into a target of desired size and shape. These sputtering targets are primarily used in the aerospace industry and in other applications where high strength and high-temperature resistance materials are required. Mo/Al sputtering targets are also known for their high thermal conductivity and a low coefficient of thermal expansion, making them an ideal choice for electronic devices, high-temperature resistant coatings, and other applications where thermal stability is important. The high purity, uniformity, and consistency of these targets make them desirable for high-quality thin-film deposition processes.
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Product Information
Molybdenum Aluminium (Mo/Al) Sputtering Target is a material used in the process of sputtering. Mo/Al sputtering targets are made by alloying molybdenum and aluminum in specific ratios and then casting the material into a target of desired size and shape. These sputtering targets are primarily used in the aerospace industry and in other applications where high strength and high-temperature resistance materials are required. Mo/Al sputtering targets are also known for their high thermal conductivity and a low coefficient of thermal expansion, making them an ideal choice for electronic devices, high-temperature resistant coatings, and other applications where thermal stability is important. The high purity, uniformity, and consistency of these targets make them desirable for high-quality thin-film deposition processes.
Chemical Formula: Mo/Al
Molybdenum Aluminium (Mo/Al) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Molybdenum Aluminium (Mo/Al) Sputtering Target
Molybdenum Aluminium (Mo/Al) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Molybdenum Aluminium (Mo/Al) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Molybdenum Aluminium (Mo/Al) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
