Product Code : ST-Mo/Cr-5N-Cu
Molybdenum Chromium (Mo/Cr) Sputtering Target is another material used in the process of sputtering. Mo/Cr sputtering targets are made by alloying molybdenum and chromium in specific ratios and then casting the material into a target of desired size and shape.
Mo/Cr sputtering targets are widely used in the semiconductor and electronic industries. They are known for their high thermal conductivity, high melting point, and excellent resistance to corrosion, making them suitable for a wide range of applications such as electrodeposited metallization, passivation, and etching. The high-purity, uniformity, and consistency of these targets make them desirable for high-quality thin-film deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD).
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Product Information
Molybdenum Chromium (Mo/Cr) Sputtering Target is another material used in the process of sputtering. Mo/Cr sputtering targets are made by alloying molybdenum and chromium in specific ratios and then casting the material into a target of desired size and shape.
Mo/Cr sputtering targets are widely used in the semiconductor and electronic industries. They are known for their high thermal conductivity, high melting point, and excellent resistance to corrosion, making them suitable for a wide range of applications such as electrodeposited metallization, passivation, and etching. The high-purity, uniformity, and consistency of these targets make them desirable for high-quality thin-film deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD).
Chemical Formula: Mo/Cr
Synonyms
Cr-Mo, chromium-molybenum, chromium-moly, mo-cr, cromoly, 4130 alloy steel, normalized alloy steel, chrome-moly, cro-moly
Molybdenum Chromium (Mo/Cr) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Molybdenum Chromium (Mo/Cr) Sputtering Target
Molybdenum Chromium (Mo/Cr) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Molybdenum Chromium (Mo/Cr) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Molybdenum Chromium (Mo/Cr) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
