Molybdenum Disulfide (MoS2) Sputtering Target

Product Information

Molybdenum disulfide (MoS2) sputtering targets are high-purity materials that are used in various thin-film deposition processes. These targets are made of molybdenum disulfide, a compound that offers exceptional lubrication properties, electrical conductivity, and thermal stability.

MoS2 sputtering targets are used in the production of thin films of MoS2 on various substrates such as glass, silicon, and metal. These thin films are used in a range of applications, including microelectronics, optical coatings, and as solid lubrication coatings.

MoS2 sputtering targets can be fabricated using various techniques, including hot pressing and cold isostatic pressing. The purity of the MoS2 target material can range from 99.9% up to 99.999%, with higher purity targets being more expensive. These targets are usually bonded to a copper or aluminum backing plate using indium.

Overall, molybdenum disulfide sputtering targets play a crucial role in the production of thin-film coatings used in various high-performance applications. They offer unique properties such as outstanding lubrication, thermal stability, and electrical conductivity, making them an ideal material for a range of industries, including microelectronics and aerospace.

Chemical Formula: MoS2
CAS Number:  1317-33-5

Synonyms

Molybdenum(IV) sulfide; Molybdenum Disulfide; Molybdenite; Molykote; hydrogen sulfide; molybdenum; Molybdenum disulphide; Molykote; bis(sulfanylidene)molybdenum; Molysulfide; Nichimoly C; Sumipowder PA; Molykote Z; disulfanylidene molybdenum; dithioxomolybdenum

Molybdenum Disulfide (MoS2)  Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Molybdenum Disulfide (MoS2)  Sputtering Target

Molybdenum Disulfide (MoS2)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Molybdenum Disulfide (MoS2) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Molybdenum Disulfide (MoS2)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers