Molybdenum Sputtering Target, Mo

Product Code : ST-Mo-3N5-Cu

Molybdenum sputtering target shares properties with its source material, either pure molybdenum or molybdenum alloy. Molybdenum metal is silvery-white and very hard. Its melting point is 2623°C (4753°F), which is only lower than tantalum, osmium, rhenium, tungsten among natural elements. It also has one of the lowest coefficients of thermal expansion among metals in commercial use.

Molybdenum target has a density of almost 100 %. The denser the Mo target is, the better the conductivity of the created layer. SAM specializes in producing high purity sputtering target materials with the highest possible density and smallest possible average grain sizes for use in the PVD, CVD, APS and VPS coating processes. You benefit from a faster process due to higher sputtering speeds.

Product Information

ATT provides high-quality Molybdenum Sputtering Target for research and industry purposes at competitive prices. We can provide Molybdenum Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula: Mo
CAS Number: 7439-98-7
Purity: >99.9%, 99.95%

Synonyms

Molybdenum sputter target, 40866, 40867, 40869

Molybdenum Sputtering Target Specification

Size：

Circular Sputtering Targets	Diameter	1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular Sputtering Targets	Width x Length	5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness		0.125”, 0.25”

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Molecular Weight	95.94
Appearance	Silvery
Melting Point	2623 °C
Boiling Point	4639 °C
Density	10280 kg/m³
Solubility in H2O	N/A
Electrical Resistivity	5.2 microhm-cm @ 0 °C
Electronegativity	1.9 Paulings
Heat of Vaporization	128 K-Cal/gm atom at 4612°C
Poisson's Ratio	0.31
Specific Heat	0.0599 Cal/g/K @ 25 °C
Tensile Strength	N/A
Thermal Conductivity	1.38 W/cm/K @ 298.2 K
Thermal Expansion	(25 °C) 4.8 µm·m^-1·K^-1
Vickers Hardness	1530 MPa
Young's Modulus	329 GPa

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Molybdenum Sputtering Target

High-performance molybdenum sputtering materials are used for thin-film coating applications, CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packing of Molybdenum Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Molybdenum Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear Formula	Mo
MDL Number	MFCD00003465
EC No.	231-107-2
Beilstein/Reaxys No.	N/A
Pubchem CID	23932
SMILES	[Mo]
InchI Identifier	InChI=1S/Mo
InchI Key	ZOKXTWBITQBERF-UHFFFAOYSA-N

Product	Product Code	Purity	Size	Contact Us
Molybdenum Sputtering Target, Mo	ST-Mo->3N-Cu	>99.9%	Customize
Nickel Chromium Sputtering Target, Ni/Cr	ST-Mo-3N5-Cu	99.95%	Customize