Product Code : ST-Ni/Ti-5N-Cu
Nickel Titanium (Ni/Ti) sputtering target is a high-purity material used in various thin film deposition processes, including physical vapor deposition (PVD) and magnetron sputtering. Nickel Titanium sputtering target is made by combining nickel and titanium in a specific composition and bonding them to a backing plate.
Ni/Ti sputtering targets offer several advantages, including high corrosion resistance, good thermal stability and high shape memory properties. Due to these favorable properties, they are used to produce a variety of applications such as sensors, biomedical devices, photovoltaics, and decorative coatings.
Ni/Ti sputtering targets are available in a range of sizes and shapes such as rectangular, circular, and cylindrical. They can also be customized to meet the specific requirements of the end-user, including composition, purity, and other properties.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
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Product Information
Nickel Titanium (Ni/Ti) sputtering target is a high-purity material used in various thin film deposition processes, including physical vapor deposition (PVD) and magnetron sputtering. Nickel Titanium sputtering target is made by combining nickel and titanium in a specific composition and bonding them to a backing plate.
Ni/Ti sputtering targets offer several advantages, including high corrosion resistance, good thermal stability and high shape memory properties. Due to these favorable properties, they are used to produce a variety of applications such as sensors, biomedical devices, photovoltaics, and decorative coatings.
Ni/Ti sputtering targets are available in a range of sizes and shapes such as rectangular, circular, and cylindrical. They can also be customized to meet the specific requirements of the end-user, including composition, purity, and other properties.
Chemical Formula:Ni/Ti
Nickel Titanium (Ni/Ti) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Nickel Titanium (Ni/Ti) Sputtering Target
Nickel Titanium (Ni/Ti) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Nickel Titanium (Ni/Ti) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Nickel Titanium (Ni/Ti) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
