Home > Products > Sputtering Targets & Evaporation Materials > Sputtering Targets > Nickel Zirconium (Ni/Zr) Sputtering Target

Nickel Zirconium (Ni/Zr) Sputtering Target

Product Code : ST-Ni/Zr-5N-Cu

Nickel Zirconium (Ni/Zr) sputtering target is a material used in the process of sputtering, which is a technique where atoms from the target material are ejected and deposited onto a substrate to form a thin film. Ni/Zr sputtering targets have excellent corrosion resistance, thermal stability, and high sputtering rates, making it a popular choice for many industrial applications such as manufacturing of magnetic sensors, wear-resistant coatings and decorative coatings. The addition of zirconium improves the hardness and oxidation resistance of the film produced. Ni/Zr sputtering targets have high purity and good uniformity, which is essential for the production of high-quality thin films.

Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Nickel Zirconium (Ni/Zr) Sputtering TargetST-Ni/Zr-2N-Cu 99%Customize
Nickel Zirconium (Ni/Zr) Sputtering TargetST-Ni/Zr-3N-Cu 99.9%Customize
Nickel Zirconium (Ni/Zr) Sputtering TargetST-Ni/Zr-4N-Cu 99.99%Customize
Nickel Zirconium (Ni/Zr) Sputtering TargetST-Ni/Zr-5N-Cu 99.999%Customize

Zirconium Sputtering Target

Nickel Zirconium (Ni/Zr) sputtering target is a material used in the process of sputtering, which is a technique where atoms from the target material are ejected and deposited onto a substrate to form a thin film. Ni/Zr sputtering targets have excellent corrosion resistance, thermal stability, and high sputtering rates, making it a popular choice for many industrial applications such as manufacturing of magnetic sensors, wear-resistant coatings and decorative coatings. The addition of zirconium improves the hardness and oxidation resistance of the film produced. Ni/Zr sputtering targets have high purity and good uniformity, which is essential for the production of high-quality thin films.

Chemical Formula:Ni/Zr


Zirconium Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Nickel Zirconium (Ni/Zr) Sputtering Target

Nickel Zirconium (Ni/Zr) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Nickel Zirconium (Ni/Zr) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Nickel Zirconium (Ni/Zr) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Related Products
(518)606-3901
(518)606-3901