Niobium Oxide Sputtering Target, Nb2O5

Product Information

Niobium oxide sputtering target from ATT is an oxide sputtering material containing Nb and O.

Niobium is a chemical element that originated from Niobe, daughter of king Tantalus from Greek mythology. It was first mentioned in 1801 and observed by C. Hatchett. The isolation was later accomplished and announced by W. Blomstrand. “Nb” is the canonical chemical symbol of niobium. Its atomic number in the periodic table of elements is 41 with a location at Period 5 and Group 5, belonging to the d-block. The relative atomic mass of niobium is 92.906 38(2) Dalton, the number in the brackets indicating the uncertainty.

Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

ATT provides high-quality Niobium oxide Sputtering Target for research and industry purposes at competitive prices. We can provide Niobium oxide Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula: Nb2O5
CAS Number: 1313-96-8

Synonyms

Niobium pentoxide, Columbian pentoxide, Diniobium pentaoxide, Niobium(V) oxide, Niobia, Niobium pentaoxide, Diniobium pentoxide, Diniobium pentaoxide, Niobium(5+) oxide

Niobium Oxide Sputtering Target Specification

Size：

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Niobium Oxide  Sputtering Target

Niobium Oxide Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. 

Packing of  Niobium Oxide  Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’ Niobium Oxide  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers