Scandium (Sc) Sputtering Target

Product Information

Scandium (Sc) sputtering target is a high-purity material used for the deposition of thin films in various industries. Scandium is a rare earth metal with unique physical and chemical properties that make it ideal for a wide range of applications. Sputtering deposition is a technique that uses a plasma to create a thin film of material on a substrate. The process requires a sputtering target, which is a material made of the same metal that is being deposited and is bombarded with high-energy ions to produce the plasma.

Scandium sputtering targets are manufactured using high-purity scandium metal and are available in various shapes and sizes to suit different applications. The targets can be made using different techniques, including powder metallurgy, hot pressing, and cold isostatic pressing, to achieve the required density and uniformity. Scandium sputtering targets are typically alloyed with other metals such as aluminum, titanium, or magnesium to improve their properties, such as corrosion resistance, adhesion, and mechanical strength.

Scandium sputtering targets find application in various fields, including semiconductors, optics, and energy. The use of scandium in semiconductors leads to the production of high-performance devices with improved efficiency, speed, and capacity. The high reflectivity and transparency of scandium thin films also make them suitable for optical coatings in building materials, mirrors, and display screens. Scandium sputtering targets are also used in energy applications, such as solid oxide fuel cells and hydrogen storage tanks.

Scandium sputtering targets are available in different purities, ranging from 99.99% to 99.999%, depending on the application requirements. High-purity targets produce films with low defect density, high uniformity, and excellent adhesion, making them ideal for demanding applications such as thin-film solar cells. The use of scandium sputtering targets is essential in advancing technology and addressing the global energy crisis.

Chemical Formula:Sc
CAS Number:  7440-20-2

Synonyms

N/A

Scandium (Sc) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Scandium (Sc)  Sputtering Target

Scandium (Sc)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Scandium (Sc) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Scandium (Sc)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers