Product Code : ST- SiO2-5N-Cu
Silicon dioxide sputtering target from ATT contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: silicon (Si) and oxygen (O2). Silica is most commonly considered to be in the form of quartz. It exists naturally in water, plants, animals and the earth. 59% of the earth’s crust is composed of silicon dioxide. In addition, it also forms more than 95% of the known rocks on Earth. Here is the structure of SiO2.
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Product Information
Silicon dioxide sputtering target from ATT contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: silicon (Si) and oxygen (O2). Silica is most commonly considered to be in the form of quartz. It exists naturally in water, plants, animals and the earth. 59% of the earth’s crust is composed of silicon dioxide. In addition, it also forms more than 95% of the known rocks on Earth. Here is the structure of SiO2.
ATT provides high-quality Silicon dioxide Sputtering Target for research and industry purposes at competitive prices. We can provide Silicon dioxide Sputtering Target with different purity, size, and density according to your requirements.
Chemical Formula: SiO2
CAS Number: 7631-86-9
Synonyms
Silicon Dioxide, Quartz, silane, dioxo, Silicon (IV) Oxide, Cristobalite, Silica, Crystalline silica, Dioxosilane, Sand
Silicon Dioxide Sputtering Target Specification
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Purity: 99.9%, 99.95%, 99.99%, 99.995%
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Properties(Theoretical)
Compound Formula | O2Si |
Molecular Weight | 60.09 |
Appearance | White Target |
Melting Point | 1,600° C (2,912° F) |
Boiling Point | 2,230° C (4,046° F) |
Density | 2533 kg/m-3 |
Solubility in H2O | N/A |
Exact Mass | 59.9668 g/mol |
Monoisotopic Mass | 59.967 Da |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Packing of Silicon Dioxide Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Silicon Dioxide Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | SiO2 |
MDL Number | MFCD00011232 |
EC No. | 262-373-8 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | N/A |
IUPAC Name | Dioxosilane |
SMILES | O=[Si]=O |
InchI Identifier | InChI=1S/O2Si/c1-3-2 |
InchI Key | VYPSYNLAJGMNEJ-UHFFFAOYSA-N |