Home > Products > Sputtering Targets & Evaporation Materials > Sputtering Targets > Silicon Dioxide Sputtering Target, SiO2

Silicon Dioxide Sputtering Target, SiO2

Product Code : ST- SiO2-5N-Cu

Silicon dioxide sputtering target from ATT contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: silicon (Si) and oxygen (O2). Silica is most commonly considered to be in the form of quartz. It exists naturally in water, plants, animals and the earth. 59% of the earth’s crust is composed of silicon dioxide. In addition, it also forms more than 95% of the known rocks on Earth. Here is the structure of SiO2.

Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Silicon Dioxide Sputtering Target, SiO2ST- SiO2-3N-Cu 99.9%Customize
Silicon Dioxide Sputtering Target, SiO2ST- SiO2-4N-Cu 99.99%Customize
Silicon Dioxide Sputtering Target, SiO2ST- SiO2-5N-Cu 99.999%Customize

Product Information

Silicon dioxide sputtering target from ATT contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: silicon (Si) and oxygen (O2). Silica is most commonly considered to be in the form of quartz. It exists naturally in water, plants, animals and the earth. 59% of the earth’s crust is composed of silicon dioxide. In addition, it also forms more than 95% of the known rocks on Earth. Here is the structure of SiO2.


ATT provides high-quality  Silicon dioxide Sputtering Target for research and industry purposes at competitive prices. We can provide  Silicon dioxide  Sputtering Target with different purity, size, and density according to your requirements.


Chemical Formula: SiO2
CAS Number: 7631-86-9


Synonyms

Silicon Dioxide, Quartz, silane, dioxo, Silicon (IV) Oxide, Cristobalite, Silica, Crystalline silica, Dioxosilane, Sand








Silicon Dioxide  Sputtering Target Specification

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Purity: 99.9%, 99.95%, 99.99%, 99.995%

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties(Theoretical)


Compound FormulaO2Si
Molecular Weight60.09
AppearanceWhite Target
Melting Point1,600° C (2,912° F)
Boiling Point2,230° C (4,046° F)
Density2533 kg/m-3
Solubility in H2ON/A
Exact Mass59.9668 g/mol
Monoisotopic Mass59.967 Da





Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.



Packing of Silicon Dioxide Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Silicon Dioxide  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.








Chemical Identifiers

Linear FormulaSiO2
MDL NumberMFCD00011232
EC No.262-373-8
Beilstein/Reaxys No.N/A
Pubchem CIDN/A
IUPAC NameDioxosilane
SMILESO=[Si]=O
InchI IdentifierInChI=1S/O2Si/c1-3-2
InchI KeyVYPSYNLAJGMNEJ-UHFFFAOYSA-N




Related Products
(518)606-3901
(518)606-3901