Product Code : ST-Sr-5N-Cu
Strontium (Sr) sputtering target is a type of thin-film deposition material used in the fabrication of electronic devices such as flat panel displays, solar cells, and semiconductors. Sputtering targets are typically made from high-purity materials and are used to deposit thin films of the substrate material onto a substrate surface through a technique called sputtering.
Strontium (Sr) sputtering targets are made from high-purity strontium metal and are used in a variety of electronic applications. Strontium is a highly reactive metal that can be easily oxidized in air, which makes it important to use high-purity material to minimize the risk of contamination in the deposited films.
The manufacturing process of Strontium (Sr) sputtering target involves melting the high-purity strontium metal in an induction furnace to create uniformity. This is followed by casting the molten metal into a pre-defined shape, typically a disc, and then polishing to a high degree of surface quality.
Strontium (Sr) sputtering targets vary in thickness and size depending on the specific use and application. They are commonly used for deposition through techniques such as radio frequency (RF) magnetron sputtering, direct current (DC) sputtering, and pulsed laser deposition (PLD) to create thin films of high-purity Strontium for a wide range of electronic applications. These applications include the production of transparent conductive oxides (TCOs) used in flat panel displays, semiconductors, and photovoltaic cells, among others.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
| Product | Product Code | Purity | Size | Contact Us |
Product Information
Strontium (Sr) sputtering target is a type of thin-film deposition material used in the fabrication of electronic devices such as flat panel displays, solar cells, and semiconductors. Sputtering targets are typically made from high-purity materials and are used to deposit thin films of the substrate material onto a substrate surface through a technique called sputtering.
Strontium (Sr) sputtering targets are made from high-purity strontium metal and are used in a variety of electronic applications. Strontium is a highly reactive metal that can be easily oxidized in air, which makes it important to use high-purity material to minimize the risk of contamination in the deposited films.
The manufacturing process of Strontium (Sr) sputtering target involves melting the high-purity strontium metal in an induction furnace to create uniformity. This is followed by casting the molten metal into a pre-defined shape, typically a disc, and then polishing to a high degree of surface quality.
Strontium (Sr) sputtering targets vary in thickness and size depending on the specific use and application. They are commonly used for deposition through techniques such as radio frequency (RF) magnetron sputtering, direct current (DC) sputtering, and pulsed laser deposition (PLD) to create thin films of high-purity Strontium for a wide range of electronic applications. These applications include the production of transparent conductive oxides (TCOs) used in flat panel displays, semiconductors, and photovoltaic cells, among others.
Chemical Formula:Sr
CAS Number: 7440-24-6
Synonyms
N/A
Strontium (Sr) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Molecular Weight | 87.62 |
| Appearance | Silvery white |
| Melting Point | 769 °C |
| Boiling Point | 1384 °C |
| Density | 2.54 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 23.0 microhm-cm @ 20 |
| Electronegativity | 1.0 Paulings |
| Heat of Vaporization | 33.8K-Cal/gm atom at 1384°C |
| Poisson's Ratio | 0.28 |
| Specific Heat | 0.0719Cal/g/K @ 25°C |
| Tensile Strength | N/A |
| Thermal Conductivity | 0.354W/cm/K @ 298.2 K |
| Thermal Expansion | 22.5 µm·m-1·K-1 (25 °C) |
| Vickers Hardness | N/A |
| Young's Modulus | 15.7 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Strontium (Sr) Sputtering Target
Strontium (Sr) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Strontium (Sr) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Strontium (Sr) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Sr |
| MDL Number | MFCD00134060 |
| EC No. | 231-133-4 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | N/A |
| SMILES | [Sr] |
| InchI Identifier | InChI=1S/Sr |
| InchI Key | CIOAGBVUUVVLOB-UHFFFAOYSA-N |
