Product Code : ST-Ta/Mo-5N-Cu
A tantalum molybdenum (Ta/Mo) sputtering target is a material used in thin film deposition by sputtering, a process where the target material is bombarded with high-energy ions to eject atoms and form a thin film on a substrate.
Ta/Mo sputtering targets contain a mixture of tantalum and molybdenum, two refractory metals that exhibit high melting points, low evaporation rates, and excellent chemical and thermal stability. Tantalum enhances the corrosion resistance and ductility of the coating, while molybdenum improves its adherence, hardness, and wear resistance.
Ta/Mo sputtering targets are commonly used in the microelectronics and semiconductor industry for advanced applications such as interconnects, contacts, gates, diffusion barriers, and metallization layers. They can also be used in optical coatings, solar cells, and aerospace components. The targets are available in various shapes and sizes, including discs, rectangles, tubes, and custom configurations, depending on the specific requirements of the deposition process.
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Product Information
A tantalum molybdenum (Ta/Mo) sputtering target is a material used in thin film deposition by sputtering, a process where the target material is bombarded with high-energy ions to eject atoms and form a thin film on a substrate.
Ta/Mo sputtering targets contain a mixture of tantalum and molybdenum, two refractory metals that exhibit high melting points, low evaporation rates, and excellent chemical and thermal stability. Tantalum enhances the corrosion resistance and ductility of the coating, while molybdenum improves its adherence, hardness, and wear resistance.
Ta/Mo sputtering targets are commonly used in the microelectronics and semiconductor industry for advanced applications such as interconnects, contacts, gates, diffusion barriers, and metallization layers. They can also be used in optical coatings, solar cells, and aerospace components. The targets are available in various shapes and sizes, including discs, rectangles, tubes, and custom configurations, depending on the specific requirements of the deposition process.
Chemical Formula:Ta/Mo
CAS Number: 146241-18-1
Synonyms
Tantalum moly, CAS 146241-18-1, Ta-Mo, TaMo, Ta/Mo – 20%/80%; 50%/50%
Tantalum Molybdenum (Ta/Mo) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Compound Formula | MoTa |
Appearance | Metallic target |
Melting Point | N/A |
Boiling Point | N/A |
Density | N/A |
Solubility in H2O | N/A |
Thermal Conductivity | 97 W/m·K |
Thermal Expansion | 5.34 ppm/K |
Monoisotopic Mass | 278.853 g/mol |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Tantalum Molybdenum (Ta/Mo) Sputtering Target
Tantalum Molybdenum (Ta/Mo) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Tantalum Molybdenum (Ta/Mo) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Tantalum Molybdenum (Ta/Mo) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | Mo-Ta |
MDL Number | N/A |
EC No. | N/A |
Pubchem CID | 71346017 |
IUPAC Name | molybdenum; tantalum |
SMILES | [Mo].[Ta] |
InchI Identifier | InChI=1S/Mo.Ta |
InchI Key | JZLMRQMUNCKZTP-UHFFFAOYSA-N |