Product Code : ST-Ti/Co-5N-Cu
A Titanium Cobalt (Ti/Co) sputtering target is a material used in thin film deposition by sputtering, a process where the target material is bombarded with high-energy ions to eject atoms and form a thin film on a substrate.
Ti/Co sputtering targets are made of a mixture of titanium and cobalt, two metals that exhibit unique mechanical, thermal, and magnetic properties.
Titanium is a strong, lightweight metal that is resistant to corrosion and high temperatures. Cobalt is a hard, brittle, and magnetic metal that has excellent wear resistance and high coercivity.
Ti/Co sputtering targets are commonly used in the magnetic storage industry (such as hard disk drives and magnetic tapes) to create high-performance thin films with high magnetic permeability, low coercivity, and low noise. They are also used in the electrical and optical industries for thin film coatings, heat-resistant layers, and protective coatings in high-temperature environments. The targets are available in various shapes and sizes, including discs, rectangles, tubes, and custom configurations, depending on the specific requirements of the deposition process.
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Product Information
A Titanium Cobalt (Ti/Co) sputtering target is a material used in thin film deposition by sputtering, a process where the target material is bombarded with high-energy ions to eject atoms and form a thin film on a substrate.
Ti/Co sputtering targets are made of a mixture of titanium and cobalt, two metals that exhibit unique mechanical, thermal, and magnetic properties.
Titanium is a strong, lightweight metal that is resistant to corrosion and high temperatures. Cobalt is a hard, brittle, and magnetic metal that has excellent wear resistance and high coercivity.
Ti/Co sputtering targets are commonly used in the magnetic storage industry (such as hard disk drives and magnetic tapes) to create high-performance thin films with high magnetic permeability, low coercivity, and low noise. They are also used in the electrical and optical industries for thin film coatings, heat-resistant layers, and protective coatings in high-temperature environments. The targets are available in various shapes and sizes, including discs, rectangles, tubes, and custom configurations, depending on the specific requirements of the deposition process.
Chemical Formula:Ti/Co
Synonyms
Ti-Co Target
Titanium Cobalt (Ti/Co) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Titanium Cobalt (Ti/Co) Sputtering Target
Titanium Cobalt (Ti/Co) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Titanium Cobalt (Ti/Co) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Titanium Cobalt (Ti/Co) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
