Product Code : ST-TiO-5N-Cu
Titanium monoxide (TiO) is a transition metal oxide which is widely used in a variety of industrial applications. Metal sputtering targets made of TiO are very interesting for use in thin-film deposition. These targets are used to coat substrates with protective coatings such as heating elements, optical devices, and electronics. TiO sputtering targets offer excellent thermal properties, wear and corrosion resistance, high electrical conductivity, and resistance to oxidation. These features make it a great material for many depositions.
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Product Information
Titanium monoxide (TiO) is a transition metal oxide which is widely used in a variety of industrial applications. Metal sputtering targets made of TiO are very interesting for use in thin-film deposition. These targets are used to coat substrates with protective coatings such as heating elements, optical devices, and electronics. TiO sputtering targets offer excellent thermal properties, wear and corrosion resistance, high electrical conductivity, and resistance to oxidation. These features make it a great material for many depositions.
Chemical Formula: TiO
CAS Number: 12137-20-1
Synonyms
Titanium(II) Oxide; Titanium(2+) oxide; Oxotitanium
Titanium Monoxide (TiO) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Compound Formula | TiO |
Molecular Weight | 63.8664 g/mol |
Appearance | bronze crystals |
Melting Point | 1750 °C |
Boiling Point | N/A |
Density | 4.95 g/cm3 |
Solubility in H2O | N/A |
Exact Mass | 63.942861 |
Monoisotopic Mass | 63.942861 |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Titanium Monoxide (TiO) Sputtering Target
Titanium Monoxide (TiO) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Titanium Monoxide (TiO) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Titanium Monoxide (TiO) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | TiO |
MDL Number | MFCD00036279 |
EC No. | 235-236-5 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | 61685 |
IUPAC Name | oxotitanium |
SMILES | O=[Ti] |
InchI Identifier | InChI=1S/O.Ti |
InchI Key | OGIDPMRJRNCKJF-UHFFFAOYSA-N |