Tungsten Carbide (WC) Sputtering Target Supplier

Tungsten Carbide (WC) Sputtering Target

Product Code : ST-WC-5N-Cu

Tungsten carbide (WC) sputtering targets are high-purity materials used in various thin-film deposition processes. These targets are made of tungsten carbide, a compound that offers excellent hardness, wear resistance, and thermal stability. WC sputtering targets are used to deposit thin films of WC on substrates such as glass, metal, and ceramic.

Tungsten carbide is widely used in the tooling industry, as well as in various other applications. It is known for its exceptional strength and resistance to wear and tear. WC sputtering targets are used in the production of cutting tools, wear-resistant coatings, and other high-performance components.

Product Information

Chemical Formula: WC

CAS Number: 12070-12-1

Tungsten Carbide (WC) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Circular Sputtering Targets	Diameter	1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular Sputtering Targets	Width x Length	5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness		0.125”, 0.25”

Properties（Theoretical）

Compound Formula	CW
Molecular Weight	195.86
Appearance	Grey-black solid
Melting Point	2,870° C (5,198° F)
Boiling Point	6,000° C (10,830° F)
Density	15 g/cm³
Solubility in H2O	N/A
Electrical Resistivity	1 10x Ω-m
Poisson's Ratio	0.24
Specific Heat	280 J/kg-K
Tensile Strength	350 MPa (Ultimate)
Thermal Conductivity	85 W/m-K
Thermal Expansion	5.4 µm/m-K
Young's Modulus	630 GPa
Exact Mass	195.950931
Monoisotopic Mass	195.950931
Charge	N/A

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Tungsten Carbide (WC) Sputtering Target

Tungsten Carbide (WC) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Tungsten Carbide (WC) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Tungsten Carbide (WC) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear Formula	WC
MDL Number	MFCD00011464
EC No.	235-123-0
Beilstein/Reaxys No.	N/A
Pubchem CID	2724274
IUPAC Name	methanidylidynetungsten
SMILES	[W+]#[C-]
InchI Identifier	InChI=1S/C.W/q-1;+1
InchI Key	UONOETXJSWQNOL-UHFFFAOYSA-N

Product	Product Code	Purity	Size	Contact Us
Tungsten Carbide (WC) Sputtering Target	ST-WC-2N-Cu	99%	Customize
Tungsten Carbide (WC) Sputtering Target	ST-WC-3N-Cu	99.9%	Customize
Tungsten Carbide (WC) Sputtering Target	ST-WC-4N-Cu	99.99%	Customize
Tungsten Carbide (WC) Sputtering Target	ST-WC-5N-Cu	99.999%	Customize