Vanadium (V) Sputtering Target

Product Code : ST-V-5N-Cu

Vanadium (V) sputtering targets are used in a variety of sputtering processes. Sputtering is a physical vapor deposition (PVD) technique used to deposit thin films on various surfaces. In this process, a sputtering tool is used to ionize an inert gas, such as argon, and then bombard a target, such as a vanadium sputtering target. The atoms of the target are then sputtered at a very high rate onto the surface of the material, creating a thin film coating. Vanadium targets are often used in these processes to create thin films and coatings for optical device, display, and memory applications. They are also used to form niche coatings and nanostructures. Vanadium has a high melting point, making it a very resilient metal that is able to survive temperatures of up to 2000 °C. Vanadium targets are available in a variety of sizes and purities, and come in both pure and alloy form.

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Product Information

Chemical Formula: V
CAS Number: 7440-62-2

Synonyms

N/A

Vanadium (V) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Circular Sputtering Targets	Diameter	1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular Sputtering Targets	Width x Length	5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness		0.125”, 0.25”

Properties（Theoretical）

Molecular Weight	163
Appearance	Silver-Grey
Melting Point	1890 °C
Boiling Point	3380 °C
Density	6.11 g/cm³
Solubility in H2O	N/A
Electrical Resistivity	25.4 microhm-cm @ 20 oC °C
Electronegativity	1.6 Paulings
Heat of Vaporization	106 K-Cal/gm atom at 3380 °C
Poisson's Ratio	0.37
Specific Heat	0.116 Cal/g/K @ 25 °C
Tensile Strength	N/A
Thermal Conductivity	0.307 W/cm/K @ 298.2 K
Thermal Expansion	(25 °C) 8.4 µm·m^-1·K^-1
Vickers Hardness	N/A
Young's Modulus	128 GPa

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Vanadium (V)Sputtering Target

Vanadium (V) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Vanadium (V) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Vanadium (V) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear Formula	V
MDL Number	MFCD00011453
EC No.	231-171-1
Beilstein/Reaxys No.	N/A
Pubchem CID	23990
SMILES	[V]
InchI Identifier	InChI=1S/V
InchI Key	LEONUFNNVUYDNQ-UHFFFAOYSA-N

Product	Product Code	Purity	Size	Contact Us
Vanadium (V) Sputtering Target	ST-V-2N-Cu	99%	Customize
Vanadium (V) Sputtering Target	ST-V-3N-Cu	99.9%	Customize
Vanadium (V) Sputtering Target	ST-V-4N-Cu	99.99%	Customize
Vanadium (V) Sputtering Target	ST-V-5N-Cu	99.999%	Customize