Home > Products > Sputtering Targets & Evaporation Materials > Sputtering Targets > Vanadium Aluminum (V/Al) Sputtering Target

Vanadium Aluminum (V/Al) Sputtering Target

Product Code : ST-V/Al-5N-Cu

A Vanadium Aluminum (V/Al) sputtering target is a material used in thin film deposition by sputtering, a process where the target material is bombarded with high-energy ions to eject atoms and form a thin film on a substrate.

Vanadium Aluminum sputtering targets are made of a mixture of vanadium and aluminum, two metals that exhibit unique mechanical, thermal, and chemical properties. Vanadium is a hard, silvery-grey metal with excellent strength and toughness, resistance to corrosion, and high-temperature stability. Aluminum is a soft, lightweight metal with a high thermal and electrical conductivity.

V/Al sputtering targets are used in a variety of industrial, scientific, and commercial applications, including the aerospace industry for creating coatings and films that enhance the performance of high-stress components such as turbine blades, exhaust systems, and structural parts. They are also used in the medical and dental industries to produce implantable devices and in the electronics industry to create conductive films and coatings. The targets are available in various shapes and sizes, including discs, rectangles, tubes, and custom configurations, depending on the specific requirements of the deposition process.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Vanadium Aluminum (V/Al) Sputtering TargetST-V/Al-2N-Cu 99%Customize
Vanadium Aluminum (V/Al) Sputtering TargetST-V/Al-3N-Cu 99.9%Customize
Vanadium Aluminum (V/Al) Sputtering TargetST-V/Al-4N-Cu 99.99%Customize
Vanadium Aluminum (V/Al) Sputtering TargetST-V/Al-5N-Cu 99.999%Customize

Product Information

A Vanadium Aluminum (V/Al) sputtering target is a material used in thin film deposition by sputtering, a process where the target material is bombarded with high-energy ions to eject atoms and form a thin film on a substrate.

Vanadium Aluminum sputtering targets are made of a mixture of vanadium and aluminum, two metals that exhibit unique mechanical, thermal, and chemical properties. Vanadium is a hard, silvery-grey metal with excellent strength and toughness, resistance to corrosion, and high-temperature stability. Aluminum is a soft, lightweight metal with a high thermal and electrical conductivity.

V/Al sputtering targets are used in a variety of industrial, scientific, and commercial applications, including the aerospace industry for creating coatings and films that enhance the performance of high-stress components such as turbine blades, exhaust systems, and structural parts. They are also used in the medical and dental industries to produce implantable devices and in the electronics industry to create conductive films and coatings. The targets are available in various shapes and sizes, including discs, rectangles, tubes, and custom configurations, depending on the specific requirements of the deposition process.

Chemical Formula:V/Al


Synonyms

Aluminum-vanadium, V-Al, AlV, VAl, Aluminum-vanadium master alloy, AlV5, AlV10, AM-92300


Vanadium Aluminum (V/Al)  Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”



Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Vanadium Aluminum (V/Al)  Sputtering Target

Vanadium Aluminum (V/Al)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Vanadium Aluminum (V/Al) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Vanadium Aluminum (V/Al)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.



Related Products
(518)606-3901
(518)606-3901