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Vanadium Carbide (VC) Sputtering Target

Product Code : ST-VC-5N-Cu

Vanadium carbide (VC) sputtering targets are high-purity materials used in various thin-film deposition processes. These targets are made of vanadium carbide, a compound that offers excellent hardness, wear resistance, and thermal stability. VC sputtering targets are used to deposit thin films of VC on substrates such as glass, metal, and ceramic.

Vanadium carbide is commonly used in the production of wear-resistant coatings and cutting tools, where its exceptional hardness and wear resistance make it an ideal material. The VC sputtering targets can be fabricated using various techniques, including hot pressing and cold isostatic pressing. The purity of the VC target material can range from 99.9% up to 99.999%, with higher purity targets being more expensive. These targets are typically bonded to a copper or aluminum backing plate using indium.

Vanadium carbide sputtering targets have several applications in industries such as aerospace, automotive, and semiconductor, where they are used to make wear-resistant coatings on cutting tools, engine components, and other high-performance parts. Overall, Vanadium carbide sputtering targets play a crucial role in the production of wear-resistant coatings and other high-performance components that require exceptional hardness, wear resistance, and thermal stability.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Vanadium Carbide (VC) Sputtering Target ST-VC-2N-Cu 99% Customize
Vanadium Carbide (VC) Sputtering Target ST-VC-3N-Cu 99.9% Customize
Vanadium Carbide (VC) Sputtering Target ST-VC-4N-Cu 99.99% Customize
Vanadium Carbide (VC) Sputtering Target ST-VC-5N-Cu 99.999% Customize

Product Information

Vanadium carbide (VC) sputtering targets are high-purity materials used in various thin-film deposition processes. These targets are made of vanadium carbide, a compound that offers excellent hardness, wear resistance, and thermal stability. VC sputtering targets are used to deposit thin films of VC on substrates such as glass, metal, and ceramic.

Vanadium carbide is commonly used in the production of wear-resistant coatings and cutting tools, where its exceptional hardness and wear resistance make it an ideal material. The VC sputtering targets can be fabricated using various techniques, including hot pressing and cold isostatic pressing. The purity of the VC target material can range from 99.9% up to 99.999%, with higher purity targets being more expensive. These targets are typically bonded to a copper or aluminum backing plate using indium.

Vanadium carbide sputtering targets have several applications in industries such as aerospace, automotive, and semiconductor, where they are used to make wear-resistant coatings on cutting tools, engine components, and other high-performance parts. Overall, Vanadium carbide sputtering targets play a crucial role in the production of wear-resistant coatings and other high-performance components that require exceptional hardness, wear resistance, and thermal stability.

Chemical Formula: VC
CAS Number: 12070-10-9


Synonyms

Vanadium(IV) carbide, vanadium monocarbide


Vanadium Carbide (VC) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Compound FormulaVC
Molecular Weight62.95
AppearanceTarget
Melting Point2,810 °C
Boiling PointN/A
Density5.77 g/cm3
Solubility in H2ON/A
Exact Mass66.975266
Monoisotopic Mass66.975266




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Vanadium Carbide (VC) Sputtering Target

Vanadium Carbide (VC)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of Vanadium Carbide (VC) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Vanadium Carbide (VC) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifiers

Linear FormulaVC
MDL NumberMFCD00049698
EC No.235-122-5
Pubchem CID56846466
IUPAC Namemethanidylidynevanadium(1+)
SMILES[C-]#[V+]
InchI IdentifierInChI=1S/C.V/q-1;+1
InchI KeyZLANVVMKMCTKMT-UHFFFAOYSA-N




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