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Vanadium Chromium (V/Cr) Sputtering Target

Product Code : ST-V/Cr-5N-Cu

Vanadium chromium sputtering target refers to a thin film deposition material that comprises vanadium and chromium metals. The V/Cr sputtering target is used in the physical vapor deposition (PVD) process to create thin films on various substrates through the application of high-energy ions using a sputtering gun. The sputtering target is used in the semiconductor, solar cell, flat-panel display, and automotive industry.

The V/Cr sputtering target is made by melting and casting the high purity vanadium and chromium metals into a specific shape and size. The sputtering target is then processed to remove any impurities, and the final product is subjected to various tests to ensure it meets the required specifications.

V/Cr sputtering target offers unique properties such as excellent mechanical strength, high thermal conductivity, and high corrosion resistance, which make it an ideal material for creating protective and wear-resistant coatings on various substrates. The target material is available in various sizes and shapes, depending on the application requirements.

Overall, the V/Cr sputtering target is a critical material in the PVD process for producing robust and durable thin films with unique properties. Its use is rapidly increasing due to the growing demand for advanced materials and the need to improve the quality and durability of products.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Vanadium Chromium (V/Cr) Sputtering Target ST-V/Cr-2N-Cu 99% Customize
Vanadium Chromium (V/Cr) Sputtering Target ST-V/Cr-3N-Cu 99.9% Customize
Vanadium Chromium (V/Cr) Sputtering Target ST-V/Cr-4N-Cu 99.99% Customize
Vanadium Chromium (V/Cr) Sputtering Target ST-V/Cr-5N-Cu 99.999% Customize

Product Information

Vanadium chromium sputtering target refers to a thin film deposition material that comprises vanadium and chromium metals. The V/Cr sputtering target is used in the physical vapor deposition (PVD) process to create thin films on various substrates through the application of high-energy ions using a sputtering gun. The sputtering target is used in the semiconductor, solar cell, flat-panel display, and automotive industry.

The V/Cr sputtering target is made by melting and casting the high purity vanadium and chromium metals into a specific shape and size. The sputtering target is then processed to remove any impurities, and the final product is subjected to various tests to ensure it meets the required specifications.

V/Cr sputtering target offers unique properties such as excellent mechanical strength, high thermal conductivity, and high corrosion resistance, which make it an ideal material for creating protective and wear-resistant coatings on various substrates. The target material is available in various sizes and shapes, depending on the application requirements.

Overall, the V/Cr sputtering target is a critical material in the PVD process for producing robust and durable thin films with unique properties. Its use is rapidly increasing due to the growing demand for advanced materials and the need to improve the quality and durability of products.

Chemical Formula:V/Cr


Vanadium Chromium (V/Cr) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”



Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Vanadium Chromium (V/Cr) Sputtering Target

Vanadium Chromium (V/Cr) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Vanadium Chromium (V/Cr) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs Vanadium Chromium (V/Cr) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


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