Vanadium Titanium (V/Ti) Sputtering Target

Product Information

Vanadium titanium sputtering target is a type of thin film deposition material that is made up of vanadium and titanium metals. This target material is used in the physical vapor deposition (PVD) process for producing thin films on various substrates. The sputtering process involves the use of a sputtering gun to provide high-energy ions that bombard the target, causing atoms to be ejected and deposited onto the substrate.

The vanadium titanium sputtering target is made by melting and casting high purity vanadium and titanium metals into a specific shape and size. The target material is then subjected to various processes to ensure that it is free from impurities and meets the required specifications for the intended application.

The target material is widely used in the semiconductor, solar cell, and flat panel display industries for its unique properties, which include high mechanical strength, excellent thermal conductivity, and corrosion resistance. Moreover, it is ideal for creating thin films with unique properties such as heat resistance, wear-resistance, and anti-corrosion.

The vanadium titanium sputtering target is available in various sizes and shapes, depending on the specific application requirements. The use of this target material is rapidly increasing due to the increasing demand for advanced materials and the need for high-performance and durable products. Therefore, vanadium titanium sputtering target is an important material in the PVD process for producing robust and high-quality thin films with unique properties.

Chemical Formula:V/Ti
 

Synonyms

Titanium-Vanadium, Vanadium-Titanium, V-Ti, Ti-V, TiV, VTi, Ti90V10, CAS 90955-52-5

Vanadium Titanium (V/Ti)  Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Vanadium Titanium (V/Ti)  Sputtering Target

Vanadium Titanium (V/Ti)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Vanadium Titanium (V/Ti) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs Vanadium Titanium (V/Ti)   Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers