Yttrium Fluoride Sputtering Target, YF3

Product Information

Yttrium fluoride sputtering target is a type of fluoride ceramic sputtering target composed of yttrium and fluorine.

Yttrium is a chemical element originated from Ytterby, Sweden. It was first mentioned in 1794 and observed by J. Gadolin. The isolation was later accomplished and announced by G. Mosander. “Y” is the canonical chemical symbol of yttrium. Its atomic number in the periodic table of elements is 39 with location at Period 5 and Group 3, belonging to the d-block. The relative atomic mass of yttrium is 88.90585(2) Dalton, the number in the brackets indicating the uncertainty.

Fluorine, also called fluorin, is a chemical element originated from the Latin ‘fluere’, meaning to flow. It was first mentioned in 1810 and observed by A.-M. Ampère. The isolation was later accomplished and announced by H. Moissan. “F” is the canonical chemical symbol of fluorine. Its atomic number in the periodic table of elements is 9 with location at Period 2 and Group 17, belonging to the p-block. The relative atomic mass of fluorine is 18.9984032(5) Dalton, the number in the brackets indicating the uncertainty.

ATT provides high-quality Yttrium fluoride Sputtering Target for research and industry purposes at competitive prices. We can provide Yttrium fluoride Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula: YF3
CAS Number: 13709-49-4

Yttrium Fluoride  Sputtering Target Specification

Size：

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Yttrium Fluoride Sputtering Target

The yttrium fluoride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packing of  Yttrium Fluoride Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Yttrium Fluoride Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers