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Yttrium Oxide (Y2O3) Sputtering Target

Product Code : ST-Y2O3-5N-Cu

Yttrium oxide (Y2O3) sputtering target is a ceramic-like substance obtained by combining yttrium metal with oxygen. It is used mainly in the field of thin film coating. It exhibits excellent electrical and chemical properties, and is often used as a dielectric, electro-optical, and electro-magnetic material in various electronic devices. It is also used as a coating material in photolithography, display chips, magnetic disks, thermistors, and other electronic components. Y2O3 sputtering targets are typically used to provide a thin film or substrate coating over a pre-existing substrate. Y2O3 sputtering targets can be manufactured in different shapes and sizes, and are typically used in conjunction with other sputtering materials. Typical applications of Y2O3 sputtering target include: display chips, optical and thermal coatings, optical projection, magnetic memories, microprocessors, microcontrollers, and many other semiconductor and electronic devices.

Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Yttrium Oxide (Y2O3) Sputtering Target ST-Y2O3-2N-Cu 99% Customize
Yttrium Oxide (Y2O3) Sputtering Target ST-Y2O3-3N-Cu 99.9% Customize
Yttrium Oxide (Y2O3) Sputtering Target ST-Y2O3-4N-Cu 99.99% Customize
Yttrium Oxide (Y2O3) Sputtering Target ST-Y2O3-5N-Cu 99.999% Customize

Product Information

Yttrium oxide (Y2O3) sputtering target is a ceramic-like substance obtained by combining yttrium metal with oxygen. It is used mainly in the field of thin film coating. It exhibits excellent electrical and chemical properties, and is often used as a dielectric, electro-optical, and electro-magnetic material in various electronic devices. It is also used as a coating material in photolithography, display chips, magnetic disks, thermistors, and other electronic components. Y2O3 sputtering targets are typically used to provide a thin film or substrate coating over a pre-existing substrate. Y2O3 sputtering targets can be manufactured in different shapes and sizes, and are typically used in conjunction with other sputtering materials. Typical applications of Y2O3 sputtering target include: display chips, optical and thermal coatings, optical projection, magnetic memories, microprocessors, microcontrollers, and many other semiconductor and electronic devices.

Chemical Formula: Y2O3
CAS Number: 1314-36-9


Synonyms

Yttria, Yttrium sesquioxide, Oxygen(2-); yttrium(3+), Yttrium trioxide, Diyttrium trioxide, Yttrium(3+) oxide

Yttrium Oxide (Y2O3)  Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Compound FormulaO3Y2
Molecular Weight225.81
AppearanceSolid
Melting Point2440 °C (4420 °F)
Boiling Point4300 °C
Density5.0 g/cm3
Solubility in H2ON/A
Specific Heat440 J/kg-K
Thermal Conductivity0.3 W/m-K
Thermal Expansion8.0 µm/m-K
Young's Modulus120 GPa
Exact Mass225.79644
Monoisotopic Mass225.79644




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Yttrium Oxide (Y2O3) Sputtering Target

Yttrium Oxide (Y2O3)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Yttrium Oxide (Y2O3) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Yttrium Oxide (Y2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifiers

Linear FormulaY2O3
MDL NumberMFCD00011473
EC No.215-233-5
Beilstein/Reaxys No.N/A
Pubchem CID518711
IUPAC Nameoxo(oxoyttriooxy)yttrium
SMILESO=[Y]O[Y]=O
InchI IdentifierInChI=1S/3O.2Y
InchI KeySIWVEOZUMHYXCS-UHFFFAOYSA-N




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