Zirconium Aluminum Sputtering Target, Zr/Al

Product Information

Zirconium aluminum sputtering target from ATT is an alloy sputtering material containing Zr and Al.

Zirconium is a chemical element that originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with a location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty.

Aluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaning bitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminium. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic magnitude of aluminium is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

ATT provides high-quality Zirconium aluminum Sputtering Target for research and industry purposes at competitive prices. We can provide  Zirconium aluminum Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula: Zr/Al

CAS Number: 7440-67-7 | 7429

Synonyms

Zirconium-aluminum, zirconium-aluminium, ZrAl, ZrAl3, Zr90Al3, aluminum-zirconium, aluminium-zirconium, CAS 12251-96-6

Zirconium Aluminum Sputtering Target Specification

Size：

Purity: 99.5%

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of  Zirconium Aluminum  Sputtering Target

The zirconium aluminum sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packing of Zirconium Aluminum Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Zirconium Aluminum  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers