Home > Products > Sputtering Targets & Evaporation Materials > Sputtering Targets > Zirconium Copper (Zr/Cu) Sputtering Target

Zirconium Copper (Zr/Cu) Sputtering Target

Product Code : ST-Zr/Cu-5N-Cu

Zirconium Copper (Zr/Cu) sputtering target is a high-quality, high-purity material used in the production of thin films for the semiconductor industry. It is a composite material that is made by blending zirconium and copper in precise proportions to achieve the desired composition.

Zirconium Copper sputtering targets are used in a variety of applications, including microelectronics, flat panel displays, and photovoltaic cells. They are also used in the development of a wide range of advanced materials, including high-temperature superconductors, high-strength alloys, and biocompatible materials.

At our company, we specialize in the manufacturing of high-quality Zirconium Copper sputtering targets. Our sputtering targets are made using advanced technology and high-purity materials to ensure maximum performance and long-lasting durability. We offer a wide range of sizes and shapes, and we can also customize targets according to customer requirements.

Customers can rely on us for high-quality products, competitive pricing, and excellent customer service. With our expertise and commitment to quality, customers can trust us to meet their specific needs and provide them with exceptional value.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Zirconium Copper (Zr/Cu) Sputtering Target ST-Zr/Cu-2N-Cu 99% Customize
Zirconium Copper (Zr/Cu) Sputtering Target ST-Zr/Cu-3N-Cu 99.9% Customize
Zirconium Copper (Zr/Cu) Sputtering Target ST-Zr/Cu-4N-Cu 99.99% Customize
Zirconium Copper (Zr/Cu) Sputtering Target ST-Zr/Cu-5N-Cu 99.999% Customize

Product Information

Zirconium Copper (Zr/Cu) sputtering target is a high-quality, high-purity material used in the production of thin films for the semiconductor industry. It is a composite material that is made by blending zirconium and copper in precise proportions to achieve the desired composition.

Zirconium Copper sputtering targets are used in a variety of applications, including microelectronics, flat panel displays, and photovoltaic cells. They are also used in the development of a wide range of advanced materials, including high-temperature superconductors, high-strength alloys, and biocompatible materials.

At our company, we specialize in the manufacturing of high-quality Zirconium Copper sputtering targets. Our sputtering targets are made using advanced technology and high-purity materials to ensure maximum performance and long-lasting durability. We offer a wide range of sizes and shapes, and we can also customize targets according to customer requirements.

Customers can rely on us for high-quality products, competitive pricing, and excellent customer service. With our expertise and commitment to quality, customers can trust us to meet their specific needs and provide them with exceptional value.

Chemical Formula:Zr/Cu


Synonyms

ZrCu, CuZr, Copper-zirconium (CuZr) master alloy, CuZr10, CuZr33, CuZr50, Alloy 150, UNS C15000, Zr2Cu intermetallic, Cu2Zr, Zr:Cu 50:50, 70:30, CAS 12158-68-8, 12019-28-2, 12186-13-9, 12054-27-2


Zirconium Copper (Zr/Cu) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Compound FormulaCu/Zr
Molecular Weight154.77
AppearanceReddish metallic target
Melting PointN/A
Boiling PointN/A
DensityN/A
Solubility in H2ON/A
Exact Mass152.834 g/mol
Monoisotopic Mass152.834 g/mol




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Zirconium Copper (Zr/Cu) Sputtering Target

Zirconium Copper (Zr/Cu)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of Zirconium Copper (Zr/Cu) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Zirconium Copper (Zr/Cu)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifiers

Linear FormulaZr-Cu
MDL NumberN/A
EC No.N/A
Pubchem CID15151429
IUPAC Namecopper; zirconium
SMILES[Cu].[Zr]
InchI IdentifierInChI=1S/Cu.Zr
InchI KeyXTYUEDCPRIMJNG-UHFFFAOYSA-N




Related Products
(518)606-3901
(518)606-3901