Product Code : ST-ZrN-5N-Cu
Zirconium Nitride (ZrN) sputtering target is a high performance material used in thin film coating applications. It is made of pure zirconium and nitrogen compound and is used as a cathode material in a process called sputtering.
In sputtering, a target material is bombarded with positive ions, causing the release of atoms from the target surface. These atoms then deposit on a substrate placed in front of the target, forming a thin film. This process is commonly used in the production of semiconductors, optics, and magnetic storage devices.
ZrN sputtering target has excellent hardness, adhesion, wear resistance, and chemical resistance properties, making it ideal for wear-resistant coatings, cutting tools, decorative coatings, and optical coatings. It is also used in aerospace and defense industries for the production of heat-resistant coatings and fuel cells.
The ZrN sputtering target is available in various sizes and shapes, including disks, plates, and tubes, to meet the specific requirements of different applications. Its high purity and uniformity ensure consistent and reliable deposition of the desired coatings.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
Product | Product Code | Purity | Size | Contact Us |
Product Information
Zirconium Nitride (ZrN) sputtering target is a high performance material used in thin film coating applications. It is made of pure zirconium and nitrogen compound and is used as a cathode material in a process called sputtering.
In sputtering, a target material is bombarded with positive ions, causing the release of atoms from the target surface. These atoms then deposit on a substrate placed in front of the target, forming a thin film. This process is commonly used in the production of semiconductors, optics, and magnetic storage devices.
ZrN sputtering target has excellent hardness, adhesion, wear resistance, and chemical resistance properties, making it ideal for wear-resistant coatings, cutting tools, decorative coatings, and optical coatings. It is also used in aerospace and defense industries for the production of heat-resistant coatings and fuel cells.
The ZrN sputtering target is available in various sizes and shapes, including disks, plates, and tubes, to meet the specific requirements of different applications. Its high purity and uniformity ensure consistent and reliable deposition of the desired coatings.
Chemical Formula: ZrN
CAS Number: 1313-49-1
Synonyms
Zinc dinitride, Trizinc dinitride
Indium Zinc Oxide (In2O3/ZnO) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Compound Formula | N2Zn3 |
Molecular Weight | 224.2 |
Appearance | Gray Target |
Melting Point | 700 °C (decomposes) |
Boiling Point | N/A |
Density | 6.2 g/cm3 |
Solubility in H2O | Insoluble; reacts |
Crystal Phase / Structure | Cubic |
Exact Mass | 221.790466 g/mol |
Monoisotopic Mass | 219.793575 g/mol |
Charge | N/A |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Zirconium Nitride (ZrN)Sputtering Target
Zirconium Nitride (ZrN) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Zirconium Nitride (ZrN) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Zirconium Nitride (ZrN) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | Zn3N2 |
MDL Number | MFCD00061327 |
EC No. | 215-207-3 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | 12130759 |
IUPAC Name | zinc; azanidylidenezinc |
SMILES | [N-]=[Zn].[N-]=[Zn].[Zn+2] |
InchI Identifier | InChI=1S/2N.3Zn/q2*-1;;;+2 |
InchI Key | AKJVMGQSGCSQBU-UHFFFAOYSA-N |