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Zirconium Tungsten (Zr/W) Sputtering Target

Product Code : ST-Zr/W-5N-Cu

Zirconium Tungsten (Zr/W) sputtering target is a type of material widely used in the semiconductor industry. It is made by blending zirconium and tungsten in precise proportions to achieve the desired composition.

Zirconium Tungsten (Zr/W) sputtering targets offer excellent thermal conductivity, high melting point, and high corrosion resistance. They are used in a wide range of applications, including the production of thin films for microelectronics, photovoltaics, and flat panel displays.

At our company, we specialize in the manufacture of high-quality Zirconium Tungsten sputtering targets. We use advanced technology and high-purity materials to ensure reliable quality, exceptional performance, and long-lasting durability. We offer a wide range of sizes and shapes of sputtering targets, and we can also customize targets according to customer requirements.

Our sputtering targets undergo rigorous quality control processes to ensure that they meet the highest standards of purity, consistency, and performance. We are committed to providing our customers with competitive pricing and exceptional customer service, and we work closely with them to identify the ideal sputtering target for their specific needs and requirements.

If you are looking for high-quality Zirconium Tungsten sputtering targets, please don't hesitate to contact us. Our expert team would be happy to discuss your needs and requirements and help you find the best solution.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Zirconium Tungsten (Zr/W) Sputtering Target ST-Zr/W-2N-Cu 99% Customize
Zirconium Tungsten (Zr/W) Sputtering Target ST-Zr/W-3N-Cu 99.9% Customize
Zirconium Tungsten (Zr/W) Sputtering Target ST-Zr/W-4N-Cu 99.99% Customize
Zirconium Tungsten (Zr/W) Sputtering Target ST-Zr/W-5N-Cu 99.999% Customize

Product Information

Zirconium Tungsten (Zr/W) sputtering target is a type of material widely used in the semiconductor industry. It is made by blending zirconium and tungsten in precise proportions to achieve the desired composition.

Zirconium Tungsten (Zr/W) sputtering targets offer excellent thermal conductivity, high melting point, and high corrosion resistance. They are used in a wide range of applications, including the production of thin films for microelectronics, photovoltaics, and flat panel displays.

At our company, we specialize in the manufacture of high-quality Zirconium Tungsten sputtering targets. We use advanced technology and high-purity materials to ensure reliable quality, exceptional performance, and long-lasting durability. We offer a wide range of sizes and shapes of sputtering targets, and we can also customize targets according to customer requirements.

Our sputtering targets undergo rigorous quality control processes to ensure that they meet the highest standards of purity, consistency, and performance. We are committed to providing our customers with competitive pricing and exceptional customer service, and we work closely with them to identify the ideal sputtering target for their specific needs and requirements.

If you are looking for high-quality Zirconium Tungsten sputtering targets, please don't hesitate to contact us. Our expert team would be happy to discuss your needs and requirements and help you find the best solution.

Chemical Formula: Zr/W





Zirconium Tungsten (Zr/W) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”



Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Zirconium Tungsten (Zr/W) Sputtering Target

Zirconium Tungsten (Zr/W)   Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of Zirconium Tungsten (Zr/W) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Zirconium Tungsten (Zr/W)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


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