Product Code : ME-Ta-5N-PO
Tantalum powder has a series of excellent properties such as a high melting point, low vapor pressure, good cold processing performance, high chemical stability, strong resistance to liquid metal corrosion, and a large dielectric constant of the surface oxide film. Our tantalum powder has the characteristics of high purity (99.95%), low oxygen content (500ppm), and small particle size (1-3um).
CAS #: 7440-25-7
Linear Formula: Ta
MDL Number: MFCD00011252
EC No.: 231-135-5
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Product | Product Code | Purity | Size | Contact Us |
Product Information
Tantalum powder has a series of excellent properties such as a high melting point, low vapor pressure, good cold processing performance, high chemical stability, strong resistance to liquid metal corrosion, and a large dielectric constant of the surface oxide film. Our tantalum powder has the characteristics of high purity (99.95%), low oxygen content (500ppm), and small particle size (1-3um).
Molecular Weight | 180.94 |
Appearance | Silvery-gray solid |
Melting Point | 3017 °C |
Boiling Point | 5458 °C |
Density | 16.69 g/cm3 (20 °C) |
Solubility in H2O | N/A |
Crystal Phase / Structure | α: body-centered cubic (bcc) / β: tetragonal |
Electrical Resistivity | 131 nΩ·m (20 °C) |
Electronegativity | 1.5 Paulings |
Heat of Fusion | 36.57 kJ/mol |
Heat of Vaporization | 753 kJ/mol |
Poisson's Ratio | 0.34 |
Specific Heat | 140 J/kg·K |
Thermal Conductivity | 57.5 W/m·K |
Thermal Expansion | 6.3 µm/m·K |
Vickers Hardness | 870–1200 MPa |
Young's Modulus | 186 GPa |
Synonyms
Tantalum particles, Tantalum microparticles, Tantalum micropowder, Tantalum micro powder, Tantalum micron powder, Tantalum submicron powder, Tantalum sub-micron powder
Specifications Of Tantalum Powder
Particle Size | -325 mesh, -200 mesh, customized |
Purity | 99.9%, 99.99%, 99.999% |
Tantalum Powder Types
Grade | Purity | Remark | |||||||||||
Ta | Nb | Fe | Ni | Cr | Si | O | H | N | C | ||||
Metallurgical Grade-150 mesh or -325 mesh | > 99.95% | < 0.010% | < 0.005% | < 0.005% | — | < 0.015% | O < 0.2% | < 0.005% | < 0.01% | < 0.015% | — | ||
Electron Beam Grade -150 mesh or -325 mesh | > 99.95% | < 0.005% | < 0.0025% | < 0.005% | — | < 0.001% | O < 0.2% | — | < 0.005% | < 0.005% | — | ||
Various Capacitor GradesAsk for detailed specs | > 99.95% | < 0.005% | <0.015% | 0.001% | 0.16%-0.28% | — | 0.007%-0.03% | 0.007%-0.01% | Specific capacitance: 3,500 to 40,000 µfv/g |
If the user has special requirements for granularity or purity, ATT can provide customized products.
Applications Of Tantalum Powder
Tantalum metal powder can be used in sputtering targets, alloys, thermal and chemical resistant coating, 3D printing (additive manufacturing), and electrolytic capacitors. There are four types of powders:
* Nodular powder from the chemical reduction of tantalum salt or oxide. The resulting powder is aggregated consisting of primary particles and pores. It has a relatively low density and high surface area
* EB powder from hydride and de-hydride of electron bean or arc melted ingot. The particle of this powder is typically angular and non-aggregated
* Capacitor Grades powder can be used to manufacture high-performance chip or dipping-type tantalum electrolyte capacitors
* Spherical powder from plasma inert gas atomization. This generates a spherical shape with a smooth surface that has excellent flow characteristics. The powder is particularly suitable for 3D printing
Packaging Of Tantalum Powder
Standard Packing:
Sealed bags in carton boxes. Special package is available on request.
ATTs’ Tantalum Powder is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | Ta |
CAS | 7440-25-7 |
MDL Number | MFCD00011252 |
EC No. | 231-135-5 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | 23956 |
SMILES | [Ta] |
InchI Identifier | InChI=1S/Ta |
InchI Key | GUVRBAGPIYLISA-UHFFFAOYSA-N |