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Zinc Sputtering Target

Product Code : ME-Zn-5N-SF

ATT specializes in producing high-purity zinc sputtering targets with the highest density and smallest average grain size for semiconductor, chemical Vapor deposition (CVD) and physical Vapor deposition (PVD) displays and optical applications. Our standard sputtering targets for thin films are available in single or combined flat target sizes and configurations up to 820 mm, with drill positions and threads, bevels, grooves and backings, designed for use with older sputtering equipment as well as the latest process equipment, such as large area coatings for solar or fuel cell and flip-chip applications. We offer targets compatible with all standard guns in all shapes and configurations, including round, rectangular, ring, oval, "dog bone", rotable (swivel), multi-tile and other standard, custom and research size sizes. All targets were analyzed using best-in-class demonstration techniques, including X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS), and inductively coupled plasma (ICP). "Sputtering" allows deposition of an ultra-high purity thin film of sputtered metal or oxide material onto another solid substrate, controlled removal of the target material by ion bombardment and conversion into a directed gas/plasma phase. Materials are produced by ultra-high purification processes such as crystallization, solid state and sublimation. ATT specializes in the production of custom compositions for commercial and research applications as well as new proprietary technologies. ATT also casts any rare earth metal and most other advanced materials into bars, rods or plates, and other mechanical shapes, and in solution and organometrics through other processes such as nanoparticles.

ATT is a professional supplier of zinc sputtering targets, and we also manufacture sheets, balls, ingots, balls, sheets, powders, rods, wires, sputtering targets, and many other forms and custom shapes. Other shapes are available upon request.

Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Zinc Sputtering Target ME-Zn-2N-SF 99% Customized
Zinc Sputtering Target ME-Zn-3N-SF 99.9% Customized
Zinc Sputtering Target ME-Zn-4N-SF 99.99% Customized
Zinc Sputtering Target ME-Zn-5N-SF 99.999% Customized

Product Information

ATT specializes in producing high-purity zinc sputtering targets with the highest density and smallest average grain size for semiconductor, chemical Vapor deposition (CVD) and physical Vapor deposition (PVD) displays and optical applications. Our standard sputtering targets for thin films are available in single or combined flat target sizes and configurations up to 820 mm, with drill positions and threads, bevels, grooves and backings, designed for use with older sputtering equipment as well as the latest process equipment, such as large area coatings for solar or fuel cell and flip-chip applications. We offer targets compatible with all standard guns in all shapes and configurations, including round, rectangular, ring, oval, "dog bone", rotable (swivel), multi-tile and other standard, custom and research size sizes. All targets were analyzed using best-in-class demonstration techniques, including X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS), and inductively coupled plasma (ICP). "Sputtering" allows deposition of an ultra-high purity thin film of sputtered metal or oxide material onto another solid substrate, controlled removal of the target material by ion bombardment and conversion into a directed gas/plasma phase. Materials are produced by ultra-high purification processes such as crystallization, solid state and sublimation. ATT specializes in the production of custom compositions for commercial and research applications as well as new proprietary technologies. ATT also casts any rare earth metal and most other advanced materials into bars, rods or plates, and other mechanical shapes, and in solution and organometrics through other processes such as nanoparticles.

ATT is a professional supplier of zinc sputtering targets, and we also manufacture sheets, balls, ingots, balls, sheets, powders, rods, wires, sputtering targets, and many other forms and custom shapes. Other shapes are available upon request.


Synonyms

Zinc sputter target, 749060, 41655, 41656, 41657, 41658

Zinc Sputtering Target Properties (Theoretical)

Molecular Weight65.38
AppearanceShiny silvery-grey metal
Melting Point420 °C
Boiling Point907 °C
Density7.14 g/cm3 (20 °C)
Solubility in H2ON/A
Electrical Resistivity59.0 nΩ·m (20 °C)
Electronegativity1.65 Paulings
Heat of Fusion7.32 kJ/mol
Heat of Vaporization115 kJ/mol
Poisson's Ratio0.25
Specific Heat0.39 J/g·°C (25 °C)
Thermal Conductivity116 W/(m·K)
Thermal Expansion30.2 µm/(m·K) (25 °C)
Young's Modulus108 GPa


Applications of Zinc Sputtering Target

Zinc is also used in alloys such as brass, nickel silver and aluminium solder. Zinc oxide is widely used in the manufacture of very many products such as paints, rubber, cosmetics, pharmaceuticals, plastics, inks, soaps, batteries, textiles and electrical equipment.


Packing of Zinc Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L)s quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Zinc Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear FormulaZn
MDL NumberMFCD00011291
EC No.231-175-3
Beilstein/Reaxys No.N/A
Pubchem CID23994
SMILES[Zn]
InchI IdentifierInChI=1S/Zn
InchI KeyHCHKCACWOHOZIP-UHFFFAOYSA-N

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