Zirconium Nitride (ZrN) Sputtering Target

Product Information

Zirconium nitride sputtering targets can be used for semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. We are a supplier of high quality zirconium nitride sputtering targets at competitive prices.

ATT offers high quality zirconium nitride sputtering targets at competitive prices for research and industrial purposes. We can provide zirconium nitride sputtering targets of different purity, size and density according to your requirements.

ATT specializes in producing high-purity zirconium nitnitide sputtering targets with the highest density, high-purity (99.99%) metal sputtering targets and the smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays and optical applications. Our standard sputtering targets for thin films are available in single or combined flat target sizes and configurations up to 820 mm, with drill positions and threads, bevels, grooves and backings, designed for use with older sputtering equipment as well as the latest process equipment, such as large area coatings for solar or fuel cell and flip-chip applications. We offer targets compatible with all standard guns in all shapes and configurations, including round, rectangular, ring, oval, "dog bone", rotable (swivel), multi-tile and other standard, custom and research size sizes. All targets were analyzed using best-in-class demonstration techniques, including X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS), and inductively coupled plasma (ICP). "Sputtering" allows deposition of an ultra-high purity thin film of sputtered metal or oxide material onto another solid substrate, controlled removal of the target material by ion bombardment and conversion into a directed gas/plasma phase. Materials are produced by ultra-high purification processes such as crystallization, solid state and sublimation.

ATT is a professional supplier of zirconium nitride (ZrN) sputtering targets, and we also manufacture optical discs, pellets, ingot, balls, sheets, powders, rods, wires, sputtering targets and many other forms and custom shapes. Other shapes are available upon request.

Synonyms

Zirconium Nitride (ZrN) Sputtering Target

Per your request or drawing

We can customized as require

Zirconium Nitride (ZrN) Sputtering Target Specification

Zirconium Nitride (ZrN) Sputtering Target Properties (Theoretical)

Applications of Zirconium Nitride (ZrN) Sputtering Target

Zirconium Nitride Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Zirconium Nitride (ZrN) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Zirconium Nitride (ZrN) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers