Zirconium Silicide (ZrSi2) Sputtering Target

Product Information

Zirconium silicide sputtering targets can be used for semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. We are a supplier of high quality zirconium silicide sputtering targets at competitive prices. ATT offers high quality zirconium silicide sputtering targets at competitive prices for research and industrial purposes. We can provide zirconium silicide sputtering targets of different purity, size and density according to your requirements.

ATT specializes in producing high-purity zirconium silicide sputtering targets with the highest density and smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays and optical applications. Our standard sputtering targets for thin films are available in single or combined flat target sizes and configurations up to 820 mm, with drill positions and threads, bevels, grooves and backings, designed for use with older sputtering units as well as the latest process equipment, such as large area coatings for solar or fuel cell and flip-chip applications. Research sizes are also targeted for production as well as custom sizes and alloys. All targets were analyzed using best-in-class demonstration techniques, including X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS), and inductively coupled plasma (ICP). "Sputtering" allows deposition of an ultra-high purity thin film of sputtered metal or oxide material onto another solid substrate, controlled removal of the target material by ion bombardment and conversion into a directed gas/plasma phase. In addition to rectangular, circular or oval targets of any size, we can also provide targets outside this range. Materials are produced by ultra-high purification processes such as crystallization, solid state and sublimation. ATT specializes in the production of custom compositions for commercial and research applications as well as new proprietary technologies. Typical and custom packaging is available. Other shapes are available upon request.

ATT is a professional supplier of tungsten oxide (WO3) sputtering targets, we also produce optical discs, pellets, ingots, balls, sheets, powders, rods, wires, sputtering targets and many other forms and custom shapes. Other shapes are available upon request.

Synonyms

Zirconium disilicide

Zirconium Silicide (ZrSi2) Sputtering Target

Per your request or drawing

We can customized as require

Zirconium Silicide (ZrSi2) Sputtering Target Specification

Applications of Zirconium Silicide (ZrSi2) Sputtering Target

Zirconium Silicide Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Zirconium Silicide (ZrSi2) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Zirconium Silicide (ZrSi2) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers